Location History:
- Atsugi, JP (1988 - 1991)
- Kawasaki, JP (1991 - 1998)
Company Filing History:
Years Active: 1988-1998
Title: Shuichi Miura: Innovator in Optical Films and Semiconductor Devices
Introduction
Shuichi Miura is a prominent inventor based in Atsugi, Japan. He has made significant contributions to the fields of optical films and semiconductor devices. With a total of 4 patents to his name, Miura's work has had a substantial impact on technology.
Latest Patents
Miura's latest patents include innovations in optical films, specifically an antireflection film and a reflection film. One of his notable inventions is an optical film with a multi-layered structure that features a high-refractive-index layer composed of titanium oxidic nitride, aluminum oxidic nitride, or silicon oxidic nitride. Additionally, he has developed a method for producing a monolithically integrated optoelectronic device. This semiconductor device includes a substrate with a low surface formed with a gentle slope, a single crystalline layer nearly level with the substrate surface, and an optical semiconductor element constructed using this layer. The device also features a wiring layer that connects the electrodes of both the optical and electronic semiconductor elements.
Career Highlights
Throughout his career, Shuichi Miura has worked with notable companies such as Fujitsu Corporation and Fujitsu Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies.
Collaborations
Miura has collaborated with esteemed colleagues, including Osamu Wada and Tatsuyuki Sanada. Their joint efforts have further advanced the innovations in their respective fields.
Conclusion
Shuichi Miura's contributions to optical films and semiconductor devices highlight his role as a key innovator in technology. His patents and collaborations reflect a commitment to advancing the industry and improving technological applications.