Company Filing History:
Years Active: 2021
Title: The Innovative Contributions of Shu Wen Diane Lim
Introduction
Shu Wen Diane Lim is a prominent inventor based in Singapore, known for his significant contributions to the field of antimicrobial applications. With a patent to his name, Lim has showcased his ability to combine scientific inquiry with practical innovation aimed at improving health outcomes.
Latest Patents
Lim's most notable patent is titled "Degradable imidazolium oligomer and polymer for antimicrobial applications." This invention revolves around an oligomer represented by a specific formula, detailing various groups as defined within the patent specification. The invention not only covers the oligomer but also includes a polymer of a different formula, along with methods for their preparation. Key applications of this patent involve the development of antimicrobial compositions and gels that actively contain these oligomers and/or polymers. Such advancements hold promise for treating microbial infections, showcasing Lim’s commitment to addressing critical healthcare challenges.
Career Highlights
Shu Wen Diane Lim is currently affiliated with the Agency for Science, Technology and Research (A*STAR) in Singapore. His work there underscores a dedication to scientific research and innovation within a prestigious institution known for its focus on driving advancements in science and technology.
Collaborations
Throughout his career, Lim has collaborated with talented colleagues, including Yugen Zhang and Yuan Yuan. These partnerships reflect the collaborative spirit of innovation often found in research environments, enabling shared insights and contributions toward groundbreaking discoveries.
Conclusion
Shu Wen Diane Lim's work in developing degradable imidazolium oligomers and polymers for antimicrobial applications highlights his innovative spirit and dedication to advancing health technologies. As he continues to develop new solutions for microbial infections, his contributions stand as an inspiration for current and future inventors in the field.