Company Filing History:
Years Active: 2019-2023
Title: Shreya Nad: Innovator in Microwave Plasma Technology
Introduction
Shreya Nad is a prominent inventor based in Hillsboro, OR (US). She has made significant contributions to the field of microwave plasma technology, holding 2 patents that showcase her innovative approach to chemical vapor deposition processes.
Latest Patents
Her latest patents focus on methods and apparatus for microwave plasma assisted chemical vapor deposition reactors. The disclosure relates to microwave cavity plasma reactor (MCPR) apparatus and associated tuning and process control methods that enable the microwave plasma assisted chemical vapor deposition (MPACVD) of components such as diamond. Related methods allow for the control of the microwave discharge position, size, and shape, facilitating efficient matching of the incident microwave power into the reactor prior to and during component deposition. Pre-deposition tuning processes provide a well-matched reactor exhibiting high plasma reactor coupling efficiency over a wide range of operating conditions. This allows operational input parameters to be modified during deposition while maintaining the reactor in a well-matched state. Additional processes are directed to real-time process control during deposition, particularly based on identified independent process variables that can effectively control desired dependent process variables while still maintaining a well-matched power coupling reactor state.
Career Highlights
Shreya Nad is affiliated with Michigan State University, where she continues to advance her research and development in microwave plasma technology. Her work has garnered attention for its potential applications in various industries, particularly in the production of high-quality materials.
Collaborations
Some of her notable coworkers include Jes Asmussen and Jing Lu, who contribute to her research endeavors and collaborative projects.
Conclusion
Shreya Nad's innovative work in microwave plasma technology positions her as a leading figure in her field. Her patents reflect her commitment to advancing chemical vapor deposition processes, paving the way for future developments in material science.