Shouhua Lv

Title: Shouhua Lv: Innovator in Mask Devices and Mechanical Parameter Calculations

Introduction

Shouhua Lv is a prominent inventor based in Beijing, China. He has made significant contributions to the field of technology, particularly in the development of mask devices and methods for calculating mechanical parameters in film layer etching regions. With a total of 6 patents to his name, his work has had a notable impact on the industry.

Latest Patents

Shouhua Lv's latest patents include a mask device and a manufacturing method thereof, as well as an evaporation system. The mask device features a frame, strip alignment plates, and a strip support plate, with hollow portions in the alignment plates. This innovative design allows for enhanced functionality in various applications. Additionally, his method for calculating equivalent mechanical parameters of a film layer etching region aims to improve the accuracy of manufacturing display substrates, ultimately reducing defects in the final products.

Career Highlights

Throughout his career, Shouhua Lv has worked with notable companies such as BOE Technology Group Co., Ltd. and Ordos Yuansheng Optoelectronics Co., Ltd. His experience in these organizations has contributed to his expertise and the development of his patented technologies.

Collaborations

Shouhua has collaborated with esteemed colleagues, including Chunchieh Huang and Baojun Li. These partnerships have fostered innovation and the exchange of ideas, further enhancing the quality of his work.

Conclusion

Shouhua Lv is a distinguished inventor whose contributions to technology, particularly in mask devices and mechanical parameter calculations, have made a significant impact. His innovative patents and collaborations reflect his commitment to advancing the field.