Shinjae Kwon

Title: Shinjae Kwon: Innovator in Advanced Technology Processes

Introduction

Shinjae Kwon is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of semiconductor technology, particularly in the area of low-k film processing. His innovative work has led to the development of a patented method that enhances the performance of advanced technology nodes.

Latest Patents

Shinjae Kwon holds a patent for an "Integrated low k recovery and ALD metal deposition process for advanced technology node." This patent describes a method that involves positioning a substrate within a processing chamber. The substrate features a first low-k film with a specific water contact angle, which is placed over an interconnect structure. The process includes cleaning the substrate to create a cleaned substrate, which then undergoes exposure to a recovery precursor, resulting in a recovered substrate. The method further involves treating the substrate with UV light and depositing a liner layer via atomic layer deposition (ALD).

Career Highlights

Shinjae Kwon is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing technologies that improve the efficiency and effectiveness of semiconductor manufacturing processes. With a total of 1 patent, Kwon has established himself as a key player in his field.

Collaborations

Shinjae has collaborated with talented coworkers, including Xinyi Lu and Fredrick Kim. Their combined expertise contributes to the innovative projects at Applied Materials, Inc.

Conclusion

Shinjae Kwon's contributions to semiconductor technology through his patented processes demonstrate his commitment to innovation. His work continues to influence advancements in the industry, showcasing the importance of research and development in technology.