Taipei, Taiwan

Shih-Hsi Tai


Average Co-Inventor Count = 2.3

ph-index = 1


Company Filing History:


Years Active: 2022-2024

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations of Shih-Hsi Tai in Thermal Technology

Introduction

Shih-Hsi Tai is a notable inventor based in New Taipei, Taiwan. He has made significant contributions to the field of thermal technology, particularly in the development of advanced substrate structures and IGBT modules. With a total of three patents to his name, Tai's work showcases his expertise and innovative spirit.

Latest Patents

Shih-Hsi Tai's latest patents include an etching method for manufacturing a substrate structure with a thick electrically conductive layer. This method involves providing an electrically insulating substrate structure that includes a thermally conductive and electrically insulating layer, an electrically conductive layer, and a non-photosensitive polymer masking layer. The process entails removing parts of the masking layer and the conductive layer to create electrically conductive recesses, ensuring a specific thickness ratio between the recess and the conductive layer. Another significant patent is for an IGBT module with a heat dissipation structure that features a specific layer thickness ratio. This module comprises a layer of IGBT chips, an upper bonding layer, a circuit layer, an insulating layer, and a heat dissipation layer, with precise thickness specifications to optimize performance.

Career Highlights

Shih-Hsi Tai is currently employed at Amulaire Thermal Technology, Inc., where he continues to innovate in the field of thermal management solutions. His work has been instrumental in advancing technologies that enhance the efficiency and reliability of electronic devices.

Collaborations

Some of his notable coworkers include Tze-Yang Yeh and Tung-Ho Tao, who contribute to the collaborative environment at Amulaire Thermal Technology, Inc. Their combined efforts foster innovation and drive the development of cutting-edge thermal technologies.

Conclusion

Shih-Hsi Tai's contributions to thermal technology through his patents and work at Amulaire Thermal Technology, Inc. highlight his role as a leading inventor in the field. His innovative methods and designs continue to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…