Shih-Chin Chang

Title: Shih-Chin Chang: Innovator in Capacitance Measurement and Crystal Growth

Introduction

Shih-Chin Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electronics and materials science, holding a total of 2 patents. His work focuses on capacitance measurement techniques and the growth of single crystals.

Latest Patents

Chang's latest patents include a capacitance measuring circuit and method. This invention discloses a circuit and method for measuring capacitance, which involves an integrator circuit, control circuits, and a processor circuit. The method utilizes a current source and charging/discharging time to generate charge amounts related to the capacitance of a capacitor being detected. Additionally, he has developed a technique for preparing graphite molds for growing single crystals of active metals and alloys. The inner surfaces of these molds are made of passive graphite, which aids in the growth of single crystals.

Career Highlights

Throughout his career, Shih-Chin Chang has worked with prominent organizations such as the National Science Council and Raydium Semiconductor Corporation. His experience in these institutions has allowed him to refine his skills and contribute to innovative projects in his field.

Collaborations

Chang has collaborated with notable colleagues, including Tsing-Shien Sheu and Yu Kuang, who have contributed to his research and development efforts.

Conclusion

Shih-Chin Chang's innovative work in capacitance measurement and single crystal growth showcases his expertise and dedication to advancing technology. His contributions continue to impact the fields of electronics and materials science.