Location History:
- Sagamihara, JP (1980)
- Zama, JP (1996)
- Tokyo, JP (1997)
- Anpachi-gun, JP (2014)
- Gifu, JP (2014 - 2019)
Company Filing History:
Years Active: 1980-2019
Title: Shigeyoshi Masuda: Innovator in Insulating Film Technology
Introduction
Shigeyoshi Masuda is a prominent inventor based in Gifu, Japan. He has made significant contributions to the field of insulating film technology, holding a total of 7 patents. His work focuses on developing materials with exceptional electrical characteristics and heat resistance.
Latest Patents
Masuda's latest patents include innovations in highly insulating films. One of his notable inventions provides a highly insulating film that boasts excellent electrical characteristics, including a high breakdown voltage and superior heat resistance. This film is a biaxially stretched product made from a styrene polymer with a syndiotactic structure as its main component. It incorporates specific inert fine particles, antioxidants, and a polymer with a glass transition temperature of 130°C or more. The film achieves a refractive index in the thickness direction ranging from 1.5750 to 1.6350. Another patent focuses on an insulating film that also features a high breakdown voltage and excellent handling properties, utilizing a biaxially oriented structure with a refractive index between 1.6050 and 1.6550.
Career Highlights
Shigeyoshi Masuda is associated with Teijin Limited, a company known for its advancements in polymer technology. His work has significantly impacted the development of insulating materials used in various applications.
Collaborations
Masuda has collaborated with notable coworkers, including Kinji Hasegawa and Masami Etchu, contributing to the advancement of insulating film technologies.
Conclusion
Shigeyoshi Masuda's innovative work in insulating film technology has led to significant advancements in the field. His patents reflect a commitment to enhancing electrical characteristics and heat resistance in materials, making him a key figure in this area of research.