Shigetoshi Ono, based in Kanagawa, Japan, is an accomplished inventor with a remarkable portfolio of 21 patents. His innovative work primarily focuses on advanced materials, including heat-sensitive recording materials and electron conductive high molecular compounds.

Latest Patents

One of his latest inventions is a heat-sensitive recording material that includes a substrate layered with a heat-sensitive recording layer and a protective layer. This protective layer is notable for its incorporation of an aqueous silicone modified polymer, ideally utilized alongside an aqueous binder and a crosslinking agent. Another significant patent involves an electron conductive high molecular compound characterized by an ethylenic repeating unit that features an electron conductive moiety. This moiety includes a compound with an aniline or heterocyclic compound as a repeating unit and links to a repeating unit of an oxyalkylene group, enhancing its conductive properties.

Career Highlights

Shigetoshi Ono has made substantial contributions to the field while working at Fuji Photo Film Company Limited. His inventive spirit has led to the development of technologies that improve the functionality and performance of heat-sensitive materials, which have wide applications in the imaging industry and beyond.

Collaborations

Throughout his career, Ono has collaborated with notable coworkers such as Shinsaku Fujita and Hirohisa Suzuki. Together, they have pushed the boundaries of material science and contributed to innovations that have a lasting impact on technology and industry.

Conclusion

Shigetoshi Ono stands out as a key figure in the realm of innovation, demonstrating his expertise and creativity through his extensive patent portfolio. His work continues to influence developments in materials science, ensuring a significant legacy in the field.

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