Location History:
- Kudamatsu, JP (2001)
- Ebina, JP (2003)
Company Filing History:
Years Active: 2001-2003
Title: **The Innovations of Shigeru Shirayone: Pioneering Plasma Processing Technologies**
Introduction
Shigeru Shirayone, an accomplished inventor based in Ebina, Japan, has made significant contributions to the field of plasma processing technology. With a total of two patents to his name, Shirayone's innovative designs reflect his expertise and dedication to advancing processing methods in the semiconductor industry.
Latest Patents
Shirayone's most recent patents include a plasma processing apparatus and a plasma processing system and method. The plasma processing apparatus is engineered for generating plasma within a processing chamber, where it utilizes electromagnetic waves from a UHF band antenna and a magnetic field produced by a surrounding generator. A notable feature of this invention is a hollow tube equipped with a measure window that prevents the entry of plasma, thereby minimizing deposit adhesion and ensuring consistent transmission quality over prolonged usage.
In his second patent, the plasma processing system and method achieve desirable processing rates and pattern capabilities for larger wafers. This innovation adeptly controls plasma state and etching gas dissociation by applying a magnetic field that interacts with a high-frequency power supply. By regulating the magnetic field's intensity, Shirayone’s invention facilitates precise manipulation of electron resonance, enabling optimization of electron density and energy distribution within the plasma.
Career Highlights
Shigeru Shirayone has played an essential role in developing cutting-edge plasma processing tools at Hitachi, Ltd. His inventions contribute greatly to enhancing the efficiency and effectiveness of semiconductor manufacturing processes, showcasing his commitment to technological advancement and innovation.
Collaborations
Throughout his career, Shirayone has collaborated with esteemed colleagues such as Toshio Masuda and Katsuhiko Mitani. Their teamwork has fostered a creative environment that further promotes advancements in plasma processing technologies.
Conclusion
As an inventor, Shigeru Shirayone's work exemplifies the spirit of innovation in the semiconductor industry. Through his patents, he has paved the way for enhanced plasma processing techniques that benefit manufacturing processes globally. His dedicated approach to research and collaboration continues to influence future developments in technology.