Shigeru Ohno

Title: Shigeru Ohno: Innovator in Ultrasound Imaging Technology

Introduction

Shigeru Ohno is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of ultrasound imaging technology. His innovative work has led to the development of a unique ultrasound image apparatus that enhances the imaging of bonded wafers.

Latest Patents

Shigeru Ohno holds a patent for an "Ultrasound image apparatus and liquid infiltration prevention method into bonded wafer." This invention involves an ultrasound image apparatus that irradiates a bonded wafer, which consists of two or more wafers bonded together, with ultrasonic waves. The apparatus generates an image of the bonded surface between the wafers. An ultrasonic probe is utilized to irradiate the bonded wafer from below, while a liquid ejection unit continuously ejects liquid to form a film between the liquid ejection unit and the bottom surface of the bonded wafer. Additionally, a gas ejection device is employed to push the liquid towards the outer peripheral end of the bonded wafer, preventing infiltration into the bonded surface.

Career Highlights

Shigeru Ohno is associated with Hitachi Power Solutions Co., Ltd., where he has been instrumental in advancing ultrasound imaging technologies. His work has not only contributed to the company's portfolio but has also enhanced the capabilities of imaging systems used in various applications.

Collaborations

Shigeru has collaborated with notable colleagues, including Kazuhiro Noda and Kotaro Kikukawa. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Shigeru Ohno's contributions to ultrasound imaging technology exemplify the impact of innovative thinking in engineering. His patent reflects a significant advancement in the imaging of bonded wafers, showcasing his dedication to improving technological processes.