Yokohama, Japan

Shigeru Nagase


Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Yokohama, JP (1997)
  • Hachiohji, JP (1999)

Company Filing History:


Years Active: 1997-1999

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Shigeru Nagase: Innovator in Fullerene Compounds

Introduction

Shigeru Nagase is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of novel fullerene compounds. With a total of 2 patents, his work has implications for various technological applications.

Latest Patents

Nagase's latest patents include a metal-encapsulated fullerene compound and a method of synthesizing such a compound. This innovative compound introduces a side chain in a metal-encapsulated fullerene, enhancing its functional properties. The synthesis involves a reaction between a disilirane or digermirane derivative and a metal-encapsulated fullerene, allowing for the addition of functional groups. Another notable patent involves an electrophotographic photosensitive member, which features a stable electrophotographic characteristic. This member consists of an electroconductive support and a photosensitive layer containing a novel fullerene compound with an organosilicon group as a charge-transporting substance.

Career Highlights

Throughout his career, Shigeru Nagase has worked with notable companies such as Doryokuro Kakunenryo Kaihatsu Jigyodan and Canon Inc. His experience in these organizations has contributed to his expertise in the field of materials science and innovation.

Collaborations

Nagase has collaborated with esteemed colleagues, including Takeshi Akasaka and Kaoru Kobayashi. These partnerships have fostered a collaborative environment that has led to advancements in his research and inventions.

Conclusion

Shigeru Nagase's contributions to the field of fullerene compounds demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to enhancing material properties for various applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…