Company Filing History:
Years Active: 2001
Title: Shigeru Murakami: Innovator in Photosensitive Resin Technology
Introduction
Shigeru Murakami is a notable inventor based in Ogaki, Japan. He has made significant contributions to the field of photosensitive materials, particularly through his innovative patent related to photosensitive resin compositions. His work is characterized by a focus on enhancing sensitivity, adhesion, and resolution in photosensitive elements.
Latest Patents
Shigeru Murakami holds a patent for a photosensitive resin composition and a photosensitive element utilizing this composition. The invention aims to provide a resin composition that exhibits excellent sensitivity and adhesion, along with high resolution and plating resistance. The composition includes a polymer with carboxyl groups, a compound with ethylene-based unsaturated groups, and a photopolymerization initiator. Notably, the compound contains at least 60 weight % of methacrylate, ensuring optimal performance in various applications.
Career Highlights
Murakami is associated with Nichigo-Morton Co., Ltd., where he has been instrumental in advancing the company's research and development efforts in photosensitive materials. His expertise in polymer chemistry and photopolymerization has positioned him as a key figure in the industry.
Collaborations
Shigeru Murakami has collaborated with Eiji Kosaka, contributing to the development of innovative solutions in the field of photosensitive resins. Their partnership has led to advancements that benefit various applications in electronics and manufacturing.
Conclusion
Shigeru Murakami's contributions to the field of photosensitive resin technology highlight his innovative spirit and dedication to enhancing material performance. His patent serves as a testament to his expertise and the potential impact of his work in various industries.