Location History:
- Sodegaura, JP (1988 - 1992)
- Chiba, JP (1988 - 2004)
Company Filing History:
Years Active: 1988-2004
Title: Shigeru Murakami: Innovator in Polymer Technology
Introduction
Shigeru Murakami is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of polymer technology, holding a total of 5 patents. His work focuses on developing advanced materials that exhibit exceptional durability and mechanical properties.
Latest Patents
One of his latest patents is for a pipe comprising an ethylene base polymer. This innovative pipe is designed to withstand high internal pressure and features a maximum residual stress of 0.13 MPa or less. The crystallinity of the material ranges from 0.630 to 0.850, with a thickness between 5 to 50 mm. This design ensures excellent durability, rigidity, and impact resistance, making it suitable for large diameter pipes. Another significant patent involves polyether copolymers, which are produced through a specific chemical reaction. These copolymers exhibit excellent heat resistance, solvent resistance, and mechanical strength, making them ideal for various applications, including resin compositions and heat-resistant laminates.
Career Highlights
Throughout his career, Shigeru Murakami has worked with Idemitsu Kosan Company, Limited, where he has contributed to various innovative projects. His expertise in polymer science has allowed him to develop materials that meet the demands of modern engineering applications.
Collaborations
Shigeru Murakami has collaborated with notable colleagues such as Shigeru Matsuo and Shinji Chino. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field of polymers.
Conclusion
Shigeru Murakami's contributions to polymer technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative work continues to influence the development of advanced materials that meet the needs of various applications.