Shigeru Moriya

Title: Shigeru Moriya: Innovator in Resist Micropattern Technology

Introduction

Shigeru Moriya is a notable inventor based in Isehara, Japan. He has made significant contributions to the field of micropatterning technology, particularly through his innovative patent. His work has implications for various applications in electronics and materials science.

Latest Patents

Moriya holds a patent for a "Method of forming resist micropattern." This method involves forming a resist pattern on a substrate by applying a resist and then radiating an energy beam that carries predetermined pattern information onto the resist. This process creates a recessed pattern in the surface of the resist without extending through it. A flat mask layer is then formed on the resist, which includes the recessed pattern. The mask layer is uniformly etched in the thickness direction until the surface of the resist is exposed, allowing the mask layer to remain at the bottom of the recessed pattern. This results in a mask pattern comprising the remaining residual mask layer. Finally, the resist is etched using this mask pattern as an etching mask. Moriya's innovative approach has led to advancements in the precision of micropatterning techniques.

Career Highlights

Shigeru Moriya is associated with Nippon Telegraph and Telephone Corporation, where he has been able to apply his expertise in resist micropatterning. His work has contributed to the development of advanced technologies in telecommunications and electronics.

Collaborations

Moriya has collaborated with notable colleagues such as Tadahito Matsuda and Katsuhiro Harada. These collaborations have fostered innovation and have led to further advancements in their respective fields.

Conclusion

Shigeru Moriya's contributions to resist micropattern technology exemplify the importance of innovation in modern science and engineering. His patent and work at Nippon Telegraph and Telephone Corporation highlight his role as a key figure in advancing technology.