Shigeru Iijima

Title: Shigeru Iijima: Innovator in Silicon Thin Film Technology

Introduction

Shigeru Iijima is a notable inventor based in Matsudo, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon thin films. His innovative work has led to the creation of a patented method that enhances the properties and production of silicon-based materials.

Latest Patents

Shigeru Iijima holds a patent for a silicon thin film and the method of producing the same. This silicon thin film is primarily composed of silicon atoms, with a hydrogen content ranging from 0 to 8 atm %. It also includes at least one element selected from fluorine, chlorine, bromine, and iodine, along with an impurity element. The unique aspect of this thin film is that about 80 to 100% of microcrystalline grains are interspersed in an amorphous phase. The production method involves deposition on a substrate in a plasma atmosphere, utilizing silane or halogenated silane as raw material gas, combined with a dopant gas. The process includes diluting the mixed gas with hydrogen to control the film deposition rate and applying electric power to achieve a specific plasma discharge power density.

Career Highlights

Shigeru Iijima is associated with Toa Nenryo Kogyo, K. K., where he has been instrumental in advancing research and development in silicon materials. His work has not only contributed to the scientific community but has also had practical applications in various industries.

Collaborations

Shigeru has collaborated with notable coworkers, including Kazunobu Tanaka and Akihisa Matsuda. Their combined expertise has furthered the research and development of innovative materials.

Conclusion

Shigeru Iijima's contributions to silicon thin film technology exemplify the impact of innovative thinking in materials science. His patented methods and collaborative efforts continue to influence advancements in the field.