Fujisawa, Japan

Shigeo Nakajima

USPTO Granted Patents = 18 

 

Average Co-Inventor Count = 3.9

ph-index = 6

Forward Citations = 99(Granted Patents)


Location History:

  • Kanagawa, JP (2004)
  • Fujisawa, JP (2005 - 2011)
  • Tokyo, JP (2013 - 2020)

Company Filing History:


Years Active: 2004-2020

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18 patents (USPTO):Explore Patents

Title: Shigeo Nakajima: Innovator in Polymer Chemistry

Introduction

Shigeo Nakajima is a distinguished inventor based in Fujisawa, Japan, known for his remarkable contributions to polymer chemistry. With a total of 18 patents to his name, he has made significant advancements in adhesive compositions and polymer formulations.

Latest Patents

Among Nakajima's latest patents is a groundbreaking invention concerning a polymer comprising conjugated diene monomer units and vinyl aromatic monomer units. This innovation emphasizes enhanced properties for various applications. Another notable patent relates to an adhesive composition and pressure-sensitive adhesive tape. This composition includes a block copolymer that contains a partially hydrogenated block copolymer, improving adhesion characteristics and offering a range of industrial applications.

Career Highlights

Shigeo Nakajima has built his career at leading organizations, notably Asahi Kasei Chemicals Corporation and Asahi Kasei Kabushiki Kaisha. His work in these companies has positioned him as a key player in the field of materials science and adhesive technology.

Collaborations

During his career, Nakajima has collaborated with esteemed colleagues such as Toshinori Shiraki and Shigeki Takayama. These partnerships have fostered innovative solutions and have contributed to the advancement of polymer-related patents.

Conclusion

Shigeo Nakajima's innovative spirit and dedication to research continue to influence the fields of polymer chemistry and adhesive technology. With a solid portfolio of patents and collaborative efforts, his work is integral to the ongoing development of innovative materials that meet modern industry demands.

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