Company Filing History:
Years Active: 2012-2014
Title: Shigehide Ito: Innovator in Barrier Technologies
Introduction
Shigehide Ito is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of barrier technologies, holding a total of 3 patents. His work focuses on developing advanced materials that enhance gas barrier properties, which are crucial in various applications.
Latest Patents
Shigehide Ito's latest patents include innovative solutions such as a barrier laminate and a gas barrier film. The barrier laminate comprises at least one organic layer and at least one inorganic layer. The organic layer has a thickness of 300 nm to 900 nm and is formed by curing a polymerizable composition that includes an aromatic (meth)acrylate and a multifunctional (meth)acrylate with an acryl equivalent weight of not more than 200. Additionally, his gas-barrier film features at least one silicon hydronitride layer and at least one silicon nitride layer on a flexible supporting substrate, providing excellent gas-barrier properties.
Career Highlights
Shigehide Ito is associated with Fujifilm Corporation, a leading company in imaging and information technology. His work at Fujifilm has allowed him to push the boundaries of material science and develop products that meet the demands of modern technology.
Collaborations
Shigehide Ito has collaborated with notable colleagues, including Jiro Tsukahara and Takeshi Senga. Their combined expertise has contributed to the successful development of innovative barrier technologies.
Conclusion
Shigehide Ito's contributions to barrier technologies through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in material science and technology.