Company Filing History:
Years Active: 2018
Title: Shifu Xu - Innovator in Optical Measurement Technology
Introduction
Shifu Xu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of optical measurement technology. His innovative work focuses on developing devices that enhance the accuracy of wavefront aberration detection in optical systems.
Latest Patents
Shifu Xu holds a patent for a "Measuring device having ideal wavefront generator for detecting point diffraction interferometric wavefront aberration of measured optical system and method for detecting wavefront aberration thereof." This device includes an optical source, an optical splitter, and various regulators and stages designed to improve the measurement of wavefront aberrations. The unique design of the ideal wavefront generator allows for precise measurements, making it a valuable tool in optical research.
Career Highlights
Shifu Xu is affiliated with the Chinese Academy of Sciences, where he conducts research and development in optical technologies. His work has been instrumental in advancing the understanding of wavefront aberrations and their impact on optical systems. With 1 patent to his name, he continues to push the boundaries of innovation in his field.
Collaborations
Shifu Xu collaborates with esteemed colleagues such as Xiangzhao Wang and Feng Tang. Their combined expertise fosters a productive research environment that leads to groundbreaking advancements in optical measurement technologies.
Conclusion
Shifu Xu's contributions to optical measurement technology exemplify the spirit of innovation. His patented device represents a significant advancement in the field, showcasing his dedication to improving optical system performance. Through his work at the Chinese Academy of Sciences, he continues to inspire future developments in this critical area of research.