Shi Gang

Title: Shi Gang - Innovator in Plasma Technology

Introduction

Shi Gang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of plasma technology, particularly through his innovative designs aimed at enhancing efficiency and uniformity in plasma reactors. His work is recognized for its potential applications in various industries, including semiconductor manufacturing.

Latest Patents

Shi Gang holds a patent for an "ICP source design for plasma uniformity and efficiency enhancement." This invention features an inductively coupled plasma (ICP) reactor with a unique enclosure design. The reactor includes a dielectric window in the ceiling, allowing for effective RF power application. A substrate support is strategically positioned below the dielectric window, while multiple gas injectors are uniformly distributed above it to supply processing gas. Additionally, a circular baffle is incorporated to redirect the flow of processing gas, optimizing the reactor's performance.

Career Highlights

Shi Gang is currently employed at Advanced Micro-Fabrication Equipment, Inc. Asia, where he continues to develop cutting-edge technologies in micro-fabrication. His expertise in plasma technology has positioned him as a key player in the advancement of manufacturing processes.

Collaborations

Shi Gang collaborates with talented colleagues, including Songlin Xu and Tuqiang Q Ni, who contribute to the innovative environment at Advanced Micro-Fabrication Equipment, Inc. Asia.

Conclusion

Shi Gang's contributions to plasma technology through his patent and work at Advanced Micro-Fabrication Equipment, Inc. Asia highlight his role as an influential inventor in the field. His innovative designs are paving the way for advancements in various applications, showcasing the importance of creativity and research in technology development.