Palo Alto, CA, United States of America

Shaun M McCarthy


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Rutland, VT (US) (2017)
  • Palo Alto, CA (US) (2018)

Company Filing History:


Years Active: 2017-2018

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2 patents (USPTO):Explore Patents

Title: Innovations by Shaun M McCarthy

Introduction

Shaun M McCarthy is an accomplished inventor based in Palo Alto, CA. He has made significant contributions to the field of technology, particularly in the area of voltage references and transducer measurements. With a total of 2 patents, his work showcases innovative approaches to electronic measurement and calibration.

Latest Patents

One of Shaun's latest patents is focused on high accuracy voltage references. This invention involves a unique configuration of two transistors connected between a power source and separate current references. The design allows for precise adjustments based on temperature variations and the ratios of the transistors and current references. Another notable patent pertains to transducer measurement, where Shaun employs a dual amplifier approach. This method utilizes two amplifiers to generate and integrate measurement voltages, enabling accurate calibration for various sensors, including image sensors and pressure sensors.

Career Highlights

Shaun M McCarthy is currently associated with Microsoft Technology Licensing, LLC, where he continues to innovate and develop new technologies. His expertise in electronic measurement systems has positioned him as a valuable asset in the tech industry.

Collaborations

Throughout his career, Shaun has collaborated with talented individuals such as Dane Snow and Barry Thompson. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Shaun M McCarthy's contributions to technology through his patents reflect his dedication to innovation and excellence in electronic measurement. His work continues to influence the field and inspire future advancements.

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