Mt. Kisco, NY, United States of America

Sharathchandra Umpathirao Pankanti


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 112(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sharathchandra Umpathirao Pankanti

Introduction

Sharathchandra Umpathirao Pankanti is an accomplished inventor based in Mt. Kisco, NY (US). He has made significant contributions to the field of biometric technology, particularly in the area of image acquisition systems. His innovative approach has led to the development of a unique patent that addresses critical challenges in biometric imaging.

Latest Patents

One of Sharathchandra's notable patents is titled "System and method for distortion control in live-scan inkless." This patent describes a computer system and method that determines the force and/or torque applied during the image acquisition stage of a biometric characteristic. The system is designed to reject images that are captured with very high or very low pressure or high shear torque. In such cases, the user or operator is notified to re-acquire the image. Additionally, the application of force and torque by the subject can be mechanically restricted to ensure that images are acquired within acceptable ranges. This innovation enhances the reliability and accuracy of biometric systems.

Career Highlights

Sharathchandra is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements in technology and innovation.

Collaborations

Some of his notable coworkers include Rudolf Maarten Bolle and Robert S Germain. Their collaborative efforts have further enriched the research and development environment at IBM.

Conclusion

Sharathchandra Umpathirao Pankanti's contributions to biometric technology through his innovative patent demonstrate his commitment to enhancing the field. His work not only addresses existing challenges but also paves the way for future advancements in biometric systems.

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