Shankaran Chelliah

Title: Shankaran Chelliah: Innovator in Semiconductor Technology

Introduction

Shankaran Chelliah is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He holds a patent that enhances the reliability of semiconductor devices through improved adhesion techniques.

Latest Patents

Shankaran Chelliah's patent, titled "Enhanced intermetal dielectric adhesion - Device and method of forming the device," focuses on a semiconductor device that includes a back-end-of-line dielectric (BEOL) with multiple intermetal dielectric (IMD) levels. This innovation involves a substrate processed with front-end-of-line components. The BEOL features an upper IMD level and upper metal lines, with a buffer layer placed over the upper metal lines. This buffer layer significantly improves the adhesion of the upper IMD layer, which in turn enhances the overall reliability of the device.

Career Highlights

Shankaran Chelliah is currently employed at Systems on Silicon Manufacturing Company Pte. Ltd., where he continues to advance his research and development efforts in semiconductor technology. His work has made a significant impact on the industry, particularly in enhancing device performance and reliability.

Collaborations

Shankaran has collaborated with several talented individuals in his field, including Pankaj Kumar Uttwani and Yee Ming Chan. These collaborations have fostered innovation and contributed to the success of their projects.

Conclusion

Shankaran Chelliah's work in semiconductor technology exemplifies the importance of innovation in enhancing device reliability. His contributions through patents and collaborations continue to shape the future of the industry.