Shandon Dee Hart

Corning, NY, United States of America

Shandon Dee Hart

USPTO Granted Patents = 108 

 

Average Co-Inventor Count = 4.9

ph-index = 18

Forward Citations = 921(Granted Patents)

Forward Citations (Not Self Cited) = 471(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Cambridge, MA (US) (2007)
  • Trumansburg, NY (US) (2013)
  • Maplewood, MN (US) (2007 - 2014)
  • Corning, NY (US) (2013 - 2022)
  • Elmira, NY (US) (2021 - 2024)

Company Filing History:


Years Active: 2007-2025

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Areas of Expertise:
Anti-Reflective Coatings
Optical Windows
Lidar Applications
Display Articles
Glass-Ceramic Composites
Durable Coatings
Hybrid Gradient-Interference Hardcoatings
Scratch-Resistant Articles
Inorganic Oxide Structures
Low-Reflectance Films
Light-Altering Features
Optical Film Structures
108 patents (USPTO):Explore Patents

Title: The Innovative Mind of Shandon Dee Hart

Introduction: Shandon Dee Hart, a pioneering inventor hailing from Corning, NY, is renowned for his groundbreaking contributions to the world of technology and innovation.

Latest Patents: Shandon Dee Hart holds several patents in the field of advanced materials, including a recent patent for a revolutionary method of enhancing solar panel efficiency through nanotechnology.

Career Highlights: With a career spanning over two decades, Shandon Dee Hart has worked tirelessly to push the boundaries of what is possible in the realm of materials science. His work has led to significant advancements in renewable energy, telecommunications, and aerospace technologies.

Collaborations: Throughout his career, Shandon Dee Hart has collaborated with leading research institutions, universities, and technology companies to bring his innovative ideas to life. His ability to work across disciplines and industries has been instrumental in the success of his projects.

Conclusion: Shandon Dee Hart's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor. His work continues to inspire future generations of inventors to push the limits of what is possible in the world of technology.

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