Location History:
- Cheonan-si, KR (2021)
- Hwaseong-si, KR (2023 - 2024)
Company Filing History:
Years Active: 2021-2025
Title: SeungWoo Choi: Innovator in Substrate Processing Technologies
Introduction
SeungWoo Choi is a prominent inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His innovative methods focus on enhancing the efficiency and effectiveness of substrate treatments.
Latest Patents
One of SeungWoo Choi's latest patents is a method for processing a substrate that provides a way to adjust film stress. In this method, a first film is formed on the substrate by supplying a first reactant and a second reactant sequentially and alternately in a first step. The first film is then converted into a second film by supplying a third reactant to the first film in a second step. The film stress of the second film is adjusted by controlling the ratio of the first step and the second step. Another notable patent is a substrate processing method capable of filling a gap structure without forming voids or seams while minimizing damage to the gap structure. This method includes forming a first thin film on a structure by performing a first cycle multiple times, which involves supplying a first reaction gas onto the structure and purging any residue. It also includes forming a second thin film by changing the chemical composition of the first thin film and forming a third thin film that matches the component of the second thin film while filling the gap.
Career Highlights
SeungWoo Choi is currently employed at ASM IP Holding B.V., where he continues to develop innovative solutions in substrate processing. His work has significantly impacted the industry, leading to advancements in manufacturing processes.
Collaborations
SeungWoo Choi collaborates with talented individuals such as Hyunchul Kim and YeaHyun Gu, contributing to a dynamic and innovative work environment.
Conclusion
SeungWoo Choi's contributions to substrate processing technologies demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of material science and engineering, paving the way for future advancements.