Daejeon, South Korea

Seunghwa Ryu


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Seunghwa Ryu: Advancements in Conductors

Introduction

Seunghwa Ryu is a notable inventor based in Daejeon, South Korea, recognized for his contributions to the field of conductors. With a single patent to his name, he has demonstrated a deep understanding of material science and its applications in technology.

Latest Patents

Ryu's patent, titled "Conductor including nano-patterned substrate and method of manufacturing the conductor," focuses on a conductor that encompasses a graphene layer. This innovative conductor features a nano pattern placed on a substrate, with the graphene layer formed on the nano pattern. The unique interaction between the nano pattern and the graphene enhances the electric characteristics while significantly improving heat transfer characteristics. This breakthrough holds potential for various applications in electronics and materials engineering.

Career Highlights

Throughout his career, Seunghwa Ryu has worked with leading organizations, including Samsung Electronics Co., Ltd. and the Korea Advanced Institute of Science and Technology. His experiences in these companies have allowed him to apply his innovative ideas in practical settings, contributing to advancements in technology.

Collaborations

Ryu has had the opportunity to collaborate with esteemed colleagues, such as Wonhee Ko and Hyowon Kim. Together, they have explored new methodologies and approaches to enhance the performance of conductors, pushing the boundaries of what is possible in their field.

Conclusion

Seunghwa Ryu exemplifies the spirit of innovation, actively contributing to advancements in conductor technology. His patent reflects a significant step forward in material science, showcasing the impact of collaboration and research in creating innovative solutions for modern technological challenges.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…