Company Filing History:
2 out of 131,611 
1 out of 1,142 Years Active: 2018-2020
Title: Seungchul Kwon: Innovator in Fine Pattern Formation
Introduction
Seungchul Kwon is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of fine pattern formation, holding a total of 2 patents. His work focuses on advanced methods that enhance the manufacturing processes in integrated circuit devices.
Latest Patents
Kwon's latest patents include innovative methods for forming fine patterns. One of his patents describes a method that involves creating a mask on an etching target, followed by the application of an anti-reflective layer. This method also includes forming fixing patterns, which expose the top surfaces of both the anti-reflective layer and the fixing patterns. The process further involves a block copolymer layer that consists of first and second polymer blocks, which are phase-separated to create distinct patterns on the anti-reflective layer. The unique aspect of this method is that the anti-reflective layer maintains a neutral interfacial energy with respect to the polymer blocks, while the fixing patterns exhibit varying interfacial energies. Another patent focuses on a block copolymer that includes a first polymer block and a second polymer block with different structures, where one of the blocks has a halogen-substituted structure.
Career Highlights
Throughout his career, Seungchul Kwon has worked with notable organizations, including Samsung Electronics Co., Ltd. and Korea University Research and Business Foundation. His experience in these institutions has allowed him to develop and refine his innovative techniques in the field of semiconductor manufacturing.
Collaborations
Kwon has collaborated with several talented individuals, including Kyeongmi Lee and Jeong Ju Park. These collaborations have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Seungchul Kwon is a distinguished inventor whose work in fine pattern formation has made a significant impact on the semiconductor industry. His innovative patents and collaborations highlight his commitment to advancing technology in this field.