Hwaseong-si, South Korea

Seung-Kook Yang


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2016)
  • Hwaseong-si, KR (2018)

Company Filing History:


Years Active: 2016-2018

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2 patents (USPTO):Explore Patents

Title: Innovations of Seung-Kook Yang

Introduction

Seung-Kook Yang is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate treatment technology. With a total of two patents to his name, Yang's work focuses on enhancing the efficiency and effectiveness of substrate processing.

Latest Patents

Yang's latest patents include a "Unit and method for cooling" and an "Apparatus and method for treating substrate." The substrate treating apparatus he developed comprises an equipment front end module, a loadlock chamber, a transfer chamber, and multiple process chambers. The loadlock chamber features a cooling unit designed to cool substrates treated in the process chambers. This cooling unit includes a cooling chamber with a gas inflow hole, support pins for substrate placement, a cooling gas injection part, and a gas exhaust part for removing cooling gas and fumes. Additionally, his patent for the substrate treating apparatus includes a plasma generating part, a housing, a susceptor for substrate support, and a baffle with injection holes for plasma delivery.

Career Highlights

Yang is currently employed at Psk Inc., where he continues to innovate in substrate treatment technologies. His work has been instrumental in advancing the capabilities of substrate processing equipment.

Collaborations

Yang collaborates with talented coworkers, including Jung-Hyun Kang and Seong-wook Lee, who contribute to the development of cutting-edge technologies in their field.

Conclusion

Seung-Kook Yang's contributions to substrate treatment technology through his innovative patents highlight his role as a significant inventor in the industry. His work continues to influence advancements in substrate processing methods.

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