Seung-Hwa Oh

Title: **Seung-Hwa Oh: Innovator in Overlay Measurement Technology**

Introduction

Seung-Hwa Oh, an accomplished inventor based in Hwaseong-si, Japan, has made significant contributions to the field of overlay measurement technology. His innovation focuses on improving the accuracy of measuring overlays in various applications, particularly in semiconductor manufacturing.

Latest Patents

Seung-Hwa Oh holds a patent titled "Method of detecting an asymmetric portion of an overlay mark and method of measuring an overlay including the same." This method involves forming a plurality of virtual overlay marks with various asymmetric portions that can differ in size compared to a reference model profile. The process aims to accurately measure the overlay of actual marks by excluding errors created by the asymmetric portions. By doing so, the overlay measurement becomes significantly more precise, enhancing the quality control in manufacturing processes.

Career Highlights

Seung-Hwa Oh is currently associated with Samsung Electronics Co., Ltd., a leading technology company known for its innovative solutions. Throughout his career, Oh has focused on refining processes that enhance measurement accuracy, making him a valuable asset in his field.

Collaborations

In his innovative journey, Seung-Hwa Oh collaborates with esteemed colleagues like Jeong-Jin Lee and Chan Soo Hwang. Together, they contribute to advances in measurement technologies that are critical for the development of cutting-edge electronics.

Conclusion

Seung-Hwa Oh embodies the spirit of innovation with his patent that addresses the challenges posed by asymmetric overlay marks. His work not only promotes accuracy in overlay measurements but also sets a standard in the semiconductor industry, reflecting his dedication to technological advancement.