Seung-Hee Han

Title: Seung-Hee Han: Innovator in Plasma Ion Implantation Technology

Introduction

Seung-Hee Han is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of plasma ion implantation technology. His innovative work has led to the development of a unique method and apparatus that enhances the efficiency of solid element implantation.

Latest Patents

Seung-Hee Han holds a patent for a "Method and apparatus for plasma ion implantation of solid element." This invention discloses an apparatus and method that enable plasma ion implantation of a solid element. The process involves placing a sample on a sample stage within a vacuum chamber, which is maintained in a vacuum state. Gas is supplied to the chamber, and a first pulsed DC power is applied to a magnetron sputtering source to generate plasma ions of a solid element. The plasma ions are then implanted onto the surface of the sample. The first power is a pulse DC power that applies high power momentarily while maintaining low average power. Additionally, a second power may be supplied to the sample stage, which is a high negative voltage pulse that accelerates the plasma ions towards the sample. Inductively coupled plasma can also be generated in the vacuum chamber via an antenna to increase the ionization rate of the solid element and lower the operational pressure of the magnetron sputtering source.

Career Highlights

Seung-Hee Han is affiliated with the Korea Institute of Science and Technology, where he continues to advance his research and development efforts. His work has garnered attention for its potential applications in various industries, particularly in materials science and engineering.

Collaborations

Seung-Hee Han has collaborated with notable colleagues, including Ji-Young Byun and Hyun-Kwang Seok. These collaborations have contributed to the advancement of research in plasma ion implantation technology.

Conclusion

Seung-Hee Han is a distinguished inventor whose work in plasma ion implantation technology has the potential to revolutionize the field. His innovative methods and collaborative efforts continue to push the boundaries of scientific research and application.