Gyeonggi-do, South Korea

Seok Hwan Lee


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Seok Hwan Lee: Innovator in Graphene Technology

Introduction

Seok Hwan Lee is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of materials science, particularly in the development of graphene-based compounds. His innovative work has led to the creation of a unique preparation method for these compounds, showcasing his expertise and dedication to advancing technology.

Latest Patents

Seok Hwan Lee holds 1 patent related to a graphene-based compound, its preparation method, and a single-phase composition for preparing graphene-based compounds and graphene quantum dots. This patent provides a comprehensive approach to creating a graphene-based compound using a single-phase composition that includes hydrocarbyl amine, a hydroxyl group-containing carbon source, and an acid. The invention not only details the preparation method but also emphasizes the significance of graphene quantum dots in various applications.

Career Highlights

Throughout his career, Seok Hwan Lee has been associated with esteemed institutions such as the Korea Advanced Institute of Science and Technology and the Korea University Research and Business Foundation. His work in these organizations has allowed him to collaborate with other experts in the field and contribute to groundbreaking research in graphene technology.

Collaborations

Some of his notable coworkers include O Ok Park and Sang Hyuk Im. Their collaborative efforts have further enhanced the research and development of innovative materials, particularly in the realm of graphene.

Conclusion

Seok Hwan Lee's contributions to graphene technology exemplify the spirit of innovation and the pursuit of scientific advancement. His patent and collaborative work highlight the potential of graphene-based materials in various applications, paving the way for future developments in this exciting field.

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