Senja Ramakers

Title: Senja Ramakers: Innovator in Fabrication Methods

Introduction

Senja Ramakers is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of fabrication methods, particularly in selectively patterning device structures. With a total of 2 patents to his name, Ramakers is recognized for his innovative approaches in technology.

Latest Patents

Senja Ramakers' latest patents focus on advanced fabrication methods. One of his notable inventions involves a method of selectively patterning a device structure using a hollow shadow wall formed on a substrate. This shadow wall consists of a base lying on the substrate's surface, with one or more side walls extending away from the surface to define an internal cavity. The method allows for selective deposition of material on the device structure, utilizing a deposition beam at a non-zero angle of incidence. This innovative approach ensures that the shadow wall prevents deposition on specific surface portions, thereby achieving precise patterning of the device component.

Career Highlights

Senja Ramakers is currently employed at Microsoft Technology Licensing, LLC, where he continues to develop and refine his innovative techniques. His work has garnered attention for its potential applications in various technological fields.

Collaborations

Some of his notable coworkers include Pavel Aseev and Amrita Singh, who contribute to the collaborative environment that fosters innovation at Microsoft.

Conclusion

Senja Ramakers stands out as an influential inventor in the realm of fabrication methods. His contributions to selectively patterning device structures highlight his commitment to advancing technology.