This inventor holds 1 USPTO granted patent. Top assignee: Tsinghua University. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Sen Lu - Innovator in Photolithography Technology
Introduction
Sen Lu is a prominent inventor based in Beijing, China. He has made significant contributions to the field of photolithography, particularly through his innovative patent that addresses vertical motion protection in motion systems.
Latest Patents
Sen Lu holds a patent for a "Vertical motion protection method and device based on dual-stage motion system of photolithography machine." This invention discloses a method that calculates the coordinates of measured points on a micro-motion stage and determines the maximum height of the stage. If this height exceeds a predetermined threshold, the system shuts down for protection, ensuring safe operation.
Career Highlights
Sen Lu is affiliated with Tsinghua University, where he continues to advance research and development in photolithography technologies. His work has been instrumental in enhancing the safety and efficiency of motion systems used in various applications.
Collaborations
Sen Lu collaborates with notable colleagues, including Kaiming Yang and Rong Cheng, who contribute to his research endeavors and innovations in the field.
Conclusion
Sen Lu's contributions to photolithography through his innovative patent demonstrate his commitment to advancing technology and ensuring safety in motion systems. His work at Tsinghua University continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile