Company Filing History:
1 out of 3,562 
1 out of 4 Years Active: 1994
Title: Seizou Meguro: Innovator in Silicon Crystal Technology
Introduction
Seizou Meguro is a notable inventor based in Hikari, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of single silicon crystals. His work has implications for various applications in electronics and materials science.
Latest Patents
Seizou Meguro holds a patent for a "Single silicon crystal having low OSF density induced by oxidation." This patent describes a single silicon crystal wafer produced by the Czochralski method, measuring not less than 100 mm in diameter. The invention focuses on achieving low oxygen-related defects in the crystal structure, which is crucial for enhancing the performance of semiconductor devices. The patent outlines specific criteria for local resistivity and oxygen concentration distribution, ensuring high-quality silicon wafers.
Career Highlights
Throughout his career, Seizou Meguro has worked with prominent companies in the industry. He has been associated with Nippon Steel Corporation and Nsc Electron Corporation, where he contributed to advancements in semiconductor materials and processes. His expertise in silicon crystal technology has positioned him as a valuable asset in the field.
Collaborations
Seizou Meguro has collaborated with notable professionals in his field, including Masaharu Tachimori and Tadashi Sakon. These collaborations have fostered innovation and development in semiconductor technology, further enhancing the quality and performance of silicon crystals.
Conclusion
Seizou Meguro's contributions to the field of silicon crystal technology are noteworthy. His patent and career achievements reflect his dedication to advancing semiconductor materials. His work continues to influence the industry and pave the way for future innovations.