Osaka, Japan

Seiki Ueno

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 2.6

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1994-2015

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3 patents (USPTO):Explore Patents

Title: Seiki Ueno: Innovator in Sealing Technologies

Introduction

Seiki Ueno is a prominent inventor based in Osaka, Japan, known for his contributions to sealing technologies. With a total of three patents to his name, Ueno has made significant advancements in the field, particularly in the development of innovative sealing materials and methods.

Latest Patents

Ueno's latest patents include a method for foaming and applying a sealing material. This method involves hot-melting the sealing material, mixing nitrogen gas into the melted material under specific pressure, and discharging the mixture into the air to create a sealing foam. This foam is then cured using ultraviolet rays, ensuring that it maintains excellent sealing performance even under extreme heat conditions. Another notable patent is for a photocurable material for sealing, which includes an oligomer with a weight average molecular weight of 10,000 to 30,000, along with other components that enhance its sealing properties, such as high tensile strength and flexibility.

Career Highlights

Ueno is currently associated with Nitta Gelatin Inc., where he continues to innovate in the field of sealing materials. His work has led to the development of products that exhibit superior performance in air-tightness and water-proofing, making them highly valuable in various applications.

Collaborations

Ueno has collaborated with notable colleagues, including Hiroyuki Nakatani and Kazuyoshi Sekita, contributing to the advancement of sealing technologies through teamwork and shared expertise.

Conclusion

Seiki Ueno's innovative work in sealing technologies has positioned him as a key figure in the industry. His patents reflect a commitment to enhancing the performance and reliability of sealing materials, making significant contributions to the field.

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