Company Filing History:
Years Active: 1997-2002
Title: Seiji Sato: Innovator in Vacuum-Processing Technology
Introduction
Seiji Sato is a prominent inventor based in Palo Alto, CA, known for his contributions to vacuum-processing technology. With a total of 3 patents, he has made significant advancements in the field, particularly in systems designed for handling electronic integrated circuit wafers.
Latest Patents
One of Seiji Sato's latest patents is a controlled environment enclosure and mechanical interface. This innovative system is designed for vacuum-processing objects such as electronic integrated circuit wafers. It comprises a carrier for transporting the wafers under vacuum in a cassette, which is supported on a movable wall that serves as a bottom cover member of the carrier. Additionally, the processing machine features a transfer chamber that is also maintained under vacuum. This transfer chamber has a movable wall in the form of an elevatable stage that sealingly closes the chamber in its outermost position. A small sealingly closed interface chamber extends between the movable walls when the cassette is mounted onto the machine. A vacuum pump evacuates the interface chamber in preparation for lowering the cassette into the transfer chamber by an elevator mechanism.
Career Highlights
Seiji Sato has built a successful career at Applied Materials, Inc., where he has been instrumental in developing cutting-edge technologies. His work has significantly impacted the efficiency and effectiveness of vacuum-processing systems used in the semiconductor industry.
Collaborations
Throughout his career, Seiji has collaborated with notable colleagues, including Boris Fishkin and Robert B. Lowrance. These partnerships have fostered innovation and contributed to the advancement of technology in their field.
Conclusion
Seiji Sato's contributions to vacuum-processing technology exemplify his dedication to innovation and excellence. His patents and work at Applied Materials, Inc. continue to influence the semiconductor industry and inspire future advancements.