Company Filing History:
Years Active: 1999-2001
Title: Seiji Ohkura: Innovator in Semiconductor Technology
Introduction
Seiji Ohkura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the performance and reliability of semiconductor devices.
Latest Patents
Ohkura's latest patents include innovations in protective insulating layers for semiconductor devices. The first patent describes a semiconductor device and a process for forming a protective insulating layer. This protective insulating film is structured in a multi-layer format. The lower layer is made from an organic-silane-based silicon oxide film, which is created using a P-CVD process with organic silane and oxygen to enhance step coverage. The upper layer consists of a silane-based silicon oxide film that contains excess silicon, exceeding the stoichiometric composition, and is also formed by a P-CVD process to improve moisture resistance. The second patent similarly details a semiconductor device that includes a two-layer protective insulating layer, emphasizing the same innovative materials and processes.
Career Highlights
Seiji Ohkura is associated with Mitsubishi Electric Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.
Collaborations
Ohkura collaborates with Kouji Oda, a fellow innovator in the field. Their combined efforts contribute to the ongoing development of cutting-edge semiconductor technologies.
Conclusion
Seiji Ohkura's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the advancement of semiconductor devices, ensuring improved performance and reliability.