Location History:
- Kyoto, JP (1987)
- Hikone, JP (1991)
- Shiga, JP (1991)
Company Filing History:
Years Active: 1987-1991
Title: Seiji Nanri: Innovator in Exposure Technology
Introduction
Seiji Nanri is a notable inventor based in Hikone, Japan. He has made significant contributions to the field of exposure technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of exposure apparatuses, particularly those utilizing halogen lamps.
Latest Patents
One of his latest patents is an "Apparatus for exposing an image of an original film on a photosensitive material." This innovative apparatus allows the film and the photosensitive material to be held together by vacuum contact between a transparent plate and a flexible sheet. It features a squeegee unit that moves while pressing the flexible sheet, effectively removing air to enhance the vacuum contact. The squeegee unit adjusts its speed based on the air resistance, ensuring rapid air removal for optimal performance.
Another significant patent is the "Method and apparatus for preventing light source degradation in an exposure apparatus." This invention includes an intermittent turning on circuit for the halogen lamp, a counter for tracking the lamp's on-time, and a determining apparatus that ensures the lamp operates continuously for a necessary period to maintain its halogen cycle. This innovation helps prolong the life of the light source, enhancing the overall efficiency of exposure processes.
Career Highlights
Seiji Nanri is currently employed at Dainippon Screen Mfg. Co., Ltd., a company renowned for its advancements in imaging and exposure technologies. His work at this esteemed organization has allowed him to develop and refine his innovative ideas, contributing to the company's reputation in the industry.
Collaborations
Throughout his career, Seiji has collaborated with talented individuals such as Fumihiko Nishida and Makoto Yahata. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Seiji Nanri's contributions to exposure technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of imaging technologies, making a lasting impact on the industry.