Seiichi Shimura

Title: Seiichi Shimura: Innovator in Silicon Wafer Analysis

Introduction

Seiichi Shimura is a notable inventor based in Ebina, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the analysis of silicon wafers. His innovative approach has led to advancements that are crucial for the fabrication of silicon wafers.

Latest Patents

Seiichi Shimura holds a patent for a method for the analysis of silicon wafers. This patent describes a simple method for evaluating the dielectric breakdown of an oxide layer on a silicon wafer. The method utilizes the SPV technique to measure the diffusion lengths of minority carriers under different lighting conditions. The calculated diffusion length, which correlates strongly with the dielectric breakdown of the oxide layer, allows for easier evaluation during the fabrication process.

Career Highlights

Throughout his career, Seiichi Shimura has worked with Komatsu Electronic Metals Co., Ltd., where he has applied his expertise in semiconductor technology. His work has been instrumental in enhancing the quality and reliability of silicon wafers used in various electronic applications.

Collaborations

Seiichi Shimura has collaborated with notable colleagues such as Shiro Yoshino and Mitsuo Kono. These collaborations have fostered an environment of innovation and have contributed to the advancement of semiconductor technologies.

Conclusion

Seiichi Shimura's contributions to the field of silicon wafer analysis exemplify the impact of innovative thinking in technology. His patent and work at Komatsu Electronic Metals Co., Ltd. highlight the importance of continuous improvement in semiconductor fabrication processes.