Company Filing History:
Years Active: 1977
Title: Innovations of Seiichi Iwamatsu
Introduction
Seiichi Iwamatsu is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, Iwamatsu's work has had a considerable impact on the industry.
Latest Patents
Iwamatsu's latest patents include a method of manufacturing a semiconductor storage device. This method involves forming a source region and a drain region in a semiconductor substrate, creating an insulating film, and implanting ions to form a floating gate. By controlling the implantation energy and dose rate, the charge accumulation in the floating gate can be managed effectively. Another patent focuses on a metal-insulator semiconductor (MIS) device. This device is manufactured by forming an insulating film on a semiconductor substrate, depositing silicon, and diffusing impurities to create source and drain regions.
Career Highlights
Seiichi Iwamatsu is currently employed at Hitachi, Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices.
Collaborations
Iwamatsu has collaborated with notable coworkers such as Shinji Shimizu and Makoto Homma. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Seiichi Iwamatsu's contributions to semiconductor technology through his patents and work at Hitachi, Ltd. highlight his importance as an inventor in the field. His innovative methods continue to shape the future of semiconductor devices.