Nagoya, Japan

Seiichi Ikeda



Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Seiichi Ikeda: Innovator in Catheter Surgery Simulation

Introduction

Seiichi Ikeda is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of medical technology, particularly in the area of catheter surgery simulation. His innovative work has the potential to enhance surgical training and improve patient outcomes.

Latest Patents

Ikeda holds a patent for a catheter surgery simulation device. This invention allows for the observation of stress applied to regions around a cavity, replicating body cavities such as blood vessels in a three-dimensional model. The simulation enables users to visualize the catheter's state alongside a photoelastic effect that corresponds to the stress state in the surrounding region caused by the catheter. This advancement is crucial for training medical professionals in catheter insertion techniques.

Career Highlights

Seiichi Ikeda is affiliated with Nagoya University, where he continues to engage in research and development in medical technologies. His work is recognized for its innovative approach to solving complex problems in the medical field.

Collaborations

Ikeda has collaborated with notable colleagues, including Toshio Fukuda and Ikuo Takahashi. Their combined expertise contributes to the advancement of medical simulation technologies.

Conclusion

Seiichi Ikeda's contributions to catheter surgery simulation represent a significant step forward in medical training and technology. His innovative patent and ongoing research at Nagoya University highlight his commitment to improving surgical practices.

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