Company Filing History:
Years Active: 2004
Title: Innovations by Sebastion Raoux in Semiconductor Processing
Introduction
Sebastion Raoux is an accomplished inventor based in San Francisco, CA. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent that addresses challenges in exhaust line cleaning.
Latest Patents
Sebastion holds a patent titled "Method and apparatus for cleaning an exhaust line in a semiconductor processing system." This invention focuses on preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus utilizes RF energy to excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state. This process allows the constituents to react and form gaseous products that can be efficiently pumped through the vacuum line. Additionally, the apparatus includes a collection chamber designed to capture particulate matter and inhibit its egress, along with an electrostatic collector to enhance particle collection.
Career Highlights
Sebastion Raoux is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in advancing technologies that improve the efficiency and effectiveness of semiconductor processing systems.
Collaborations
Sebastion collaborates with talented individuals such as Ben Pang and David Wingto Cheung, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Sebastion Raoux's contributions to semiconductor processing through his innovative patent demonstrate his expertise and commitment to advancing technology in this critical field. His work continues to impact the industry positively.