Company Filing History:
Years Active: 2009-2012
Title: Innovations of Sebastian E Van Nooten
Introduction
Sebastian E Van Nooten is a notable inventor based in Bilthoven, Netherlands. He has made significant contributions to the field of plasma enhanced atomic layer deposition, with a focus on forming non-conformal layers. His innovative approaches have led to the development of two patents that enhance the efficiency and effectiveness of deposition processes.
Latest Patents
Sebastian's latest patents revolve around the method of forming non-conformal layers. In one aspect, these layers are created by varying parameters such as pulse duration, separation, RF power on-time, reactant concentration, pressure, and electrode spacing. This modulation allows the process to operate in a depletion-effect mode, enabling deposition close to the substrate surface while controlling the termination after reaching a specified distance into openings, such as deep DRAM trenches and pores. Additionally, the method involves alternately and sequentially contacting a substrate with at least two different reactants, ensuring that an under-saturated dose of at least one reactant is uniformly provided across the substrate surface. This results in a film that does not fully cover the surfaces of the openings, leading to depletion effects in less accessible regions.
Career Highlights
Sebastian E Van Nooten is currently employed at Asm America, Inc., where he continues to innovate and develop new technologies in the field of atomic layer deposition. His work has been instrumental in advancing the capabilities of deposition techniques, making them more adaptable and efficient.
Collaborations
Sebastian has collaborated with notable coworkers, including Jan Willem Maes and Steven Marcus. Their combined expertise has contributed to the successful development of innovative solutions in their field.
Conclusion
Sebastian E Van Nooten's contributions to the field of plasma enhanced atomic layer deposition are noteworthy. His patents reflect a deep understanding of the complexities involved in forming non-conformal layers, showcasing his innovative spirit and dedication to advancing technology.