Company Filing History:
Years Active: 2010-2012
Title: Scott Stoddard: Innovator in Semiconductor Processes
Introduction
Scott Stoddard is a notable inventor based in Sherwood, OR (US). He has made significant contributions to the field of semiconductor processes, holding a total of 3 patents. His work focuses on improving the efficiency and reliability of gas treatments used in various applications.
Latest Patents
One of Scott's latest patents is a method for purifying acetylene gas for use in semiconductor processes. This innovative method treats acetylene to remove residual storage solvents that may be present. The treatment ensures that the acetylene gas stream maintains a consistent concentration of storage solvent, regardless of the amount of acetylene released from the source. This process may involve condensing the storage solvent from the gas stream at specific temperatures and separating it from the gas.
Another significant patent by Scott is a method for improved thickness repeatability of PECVD deposited carbon films. This method enhances the deposition of carbon-based films using acetylene as a precursor. By utilizing a low-vapor pressure solvent, such as dimethylfluoride (DMF), Scott's method stabilizes the acetylene and delivers it to the deposition chamber. This approach results in improved wafer-to-wafer thickness uniformity and increases the usable amount of acetylene in the source to over 95%.
Career Highlights
Scott Stoddard is currently employed at Novellus Systems Incorporated, where he continues to innovate in the semiconductor industry. His expertise in gas treatment processes has positioned him as a valuable asset to his company and the field at large.
Collaborations
Throughout his career, Scott has collaborated with talented individuals such as Gishun Hsu and Charles Lorenzo Merrill. These collaborations have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Scott Stoddard is a prominent inventor whose work in semiconductor processes has led to significant advancements in gas treatment methods. His innovative patents reflect his commitment to improving technology in this critical field.