Broomfield, CO, United States of America

Scott Morrison


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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2 patents (USPTO):Explore Patents

Title: Innovations of Scott Morrison

Introduction

Scott Morrison is a notable inventor based in Broomfield, Colorado, who has made significant contributions to the field of chemical vapor deposition. With a total of 2 patents to his name, Morrison's work focuses on advancing technologies that enhance the fabrication of high-quality thin film silicon and related materials.

Latest Patents

Morrison's latest patent is a hot wire chemical vapor deposition method and apparatus using graphite hot rods. This innovative method allows for the fabrication of high-quality amorphous, micro-crystalline, and poly-crystalline thin film silicon. The process involves a silane gas that impinges upon a hot graphite rod assembly, breaking down the gas into its individual constituents. These constituents then deposit on an inert substrate member. The design includes an adjustable distance between the hot graphite rod assembly and the substrate member, along with a shutter to shield the substrate during the heating process. The assembly consists of multiple mutually parallel and coplanar rods, which are oscillated to optimize the deposition process.

Career Highlights

Morrison has been instrumental in developing advanced technologies at Mv Systems, Inc. His work has contributed to the company's reputation for innovation in the field of chemical vapor deposition. His expertise in this area has positioned him as a key figure in the development of new materials and devices.

Collaborations

Morrison has collaborated with talented individuals such as Arun Madan and Jianping Xi, who have contributed to his projects and innovations. Their combined expertise has further enhanced the quality and impact of their work in the field.

Conclusion

Scott Morrison's contributions to the field of chemical vapor deposition through his innovative patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in the fabrication of thin film silicon and related technologies.

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