Scott C Dudley

Title: Scott C Dudley: Innovator in Automated Measurement Systems

Introduction

Scott C Dudley is a notable inventor based at the Air Force Academy in Colorado, USA. He has made significant contributions to the field of automated measurement systems, particularly in the area of semiconductor technology. His innovative approach has led to the development of a unique method for measuring etch pit density in GaAs wafers.

Latest Patents

Scott C Dudley holds a patent for a "Method and system for automated measurement of whole-wafer etch pit." This patent describes a system that tests an etch GaAs wafer for fractional transmission at multiple points across its surface. The process involves detecting and amplifying the fractional transmission of light through the wafer, which is then analyzed by a computer. By selecting at least two points of transmission measurement for calibration, the system can calculate values for fractional transmission in regions of varying etch pit density. This innovative method allows for a direct conversion of transmission data to etch pit density.

Career Highlights

Dudley is associated with the United States of America as represented by the Secretary of the Air Force. His work has been instrumental in advancing measurement techniques that are crucial for the semiconductor industry. His dedication to research and development has positioned him as a key figure in his field.

Collaborations

Some of Scott C Dudley's notable coworkers include David C Look and James S Sewell. Their collaborative efforts have contributed to the success of various projects and innovations within their organization.

Conclusion

Scott C Dudley exemplifies the spirit of innovation through his contributions to automated measurement systems. His patent on etch pit density measurement showcases his expertise and commitment to advancing technology in the semiconductor industry.