Mt. Prospect, IL, United States of America

Scott Blackstone



Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 31(Granted Patents)


Location History:

  • Mt. Prospect, IL (US) (1985)
  • Mount Prospect, IL (US) (1986)

Company Filing History:


Years Active: 1985-1986

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2 patents (USPTO):Explore Patents

Title: Scott Blackstone: Innovator in Thin Film Technology

Introduction

Scott Blackstone is a notable inventor based in Mt. Prospect, IL (US). He has made significant contributions to the field of thin film technology, holding 2 patents that showcase his innovative approaches to material science.

Latest Patents

One of his latest patents is titled "Method of making thin free standing single crystal films." This invention describes a process for producing thin free standing single crystal films by sputter depositing a layer of stressable metal onto a single crystal substrate. The composite is treated to stress the metal layer, which then peels away with a portion of the single crystal substrate attached. The resulting free standing film typically has a thickness in the order of tens of micrometers. The metal layer can be removed through acid etching or other suitable techniques, leaving a free standing single crystal film with a thickness ranging from about 5 microns to over 50 microns.

Another significant patent is "Method of depositing fully reacted titanium disilicide thin films." This invention involves a method of sputtering material onto a substrate that is first locally heated to increase surface mobility. A material is then sputtered onto the substrate with sufficient energy to exceed the activation energy required for a chemical reaction between the substrate and the sputtered material. In this preferred embodiment, the substrate is silicon, and the sputtered material is a refractory metal such as titanium.

Career Highlights

Scott Blackstone has been associated with Gould Inc., where he has applied his expertise in material science and thin film technology. His work has contributed to advancements in various applications, enhancing the performance and efficiency of electronic devices.

Collaborations

Throughout his career, Scott has collaborated with notable colleagues, including Minas Hagop Tanielian and Robert E Lajos. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Scott Blackstone's contributions to thin film technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to impact the field of material science and electronic applications.

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