Company Filing History:
Years Active: 1985-1988
Title: The Innovative Contributions of Schunich Ohta in Semiconductor Technology
Introduction
Schunich Ohta, an accomplished inventor based in Fujisawa, Japan, has made significant strides in the field of semiconductor technology. With two patents to his name, Ohta's work focuses on developing advanced solutions for treating toxic gases involved in semiconductor manufacturing processes.
Latest Patents
Ohta's latest patents revolve around absorbents designed for effectively removing hazardous materials such as SiH₄, B₂H₆, SeH₂, AsH₃, PH₃, GeH₄, SiH₂Cl₂, SiHCl₃, (CH₃)₃Al, and (CH₃)₃Ga from gaseous mixtures. His innovative absorbent comprises two primary components: a first and a second dry absorbent. The first absorbent uses a solid carrier predominantly composed of a porous inorganic silicate and is impregnated with an aqueous solution of an alkali. The second absorbent features a similar solid carrier, but it is also impregnated with an aqueous solution of an alkali and an oxidizing agent that can oxidize germane.
When used alone, these absorbents may not effectively treat certain volatile inorganic hydrides or may quickly lose absorption capacity. To optimize the gas treatment process, Ohta introduces a third absorbent, which again features a porous solid carrier and is treated with an oxidizing agent that does not oxidize germane. This clever combination allows for a highly effective three-stage treatment process, ensuring that gases containing toxic components are adequately processed for semiconductor manufacturing.
Career Highlights
Ohta's tenure at Nihonsanso Kabushiki Kaisha, a leading company in gas treatment technologies, has played a pivotal role in enhancing his innovative abilities. His experience in this sector has enabled him to focus on developing practical solutions to meet the specific challenges of the semiconductor industry. His two patents exemplify the advanced knowledge and skills he possesses in this highly specialized field.
Collaborations
Throughout his career, Schunich Ohta has collaborated with notable coworkers Masayasu Kitayama and Yoshiaki Sugimori. Their teamwork has further enriched the innovation landscape at Nihonsanso, leading to significant advancements in gas treatment technologies.
Conclusion
In conclusion, Schunich Ohta is a prominent figure in the realm of semiconductor technology, with patents that reflect his commitment to addressing the complexities of toxic gas treatment. His work not only highlights the importance of safe practices in the semiconductor industry but also showcases the continual innovation that drives this essential field forward.