Tokyo, Japan

Satoshi Takeno

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 1.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2020-2024

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5 patents (USPTO):Explore Patents

Title: The Innovative Journey of Satoshi Takeno

Introduction: Satoshi Takeno is a prominent inventor based in Tokyo, Japan, recognized for his significant contributions to the field of coating compositions. With a remarkable portfolio of five patents, his work continues to push the boundaries of innovation in chemical engineering and materials science.

Latest Patents: Among his latest inventions is a polyaspartic coating composition designed to enhance the durability and performance of coated articles. This composition includes an aspartic acid ester compound and a polyisocyanate obtained through the reaction of specific diisocyanate monomers with a polycaprolactone polyol. The innovative formula ensures that the polyisocyanate component contains a minimal amount of isocyanurate trimer while maintaining a high number of isocyanate groups. These patents reflect Satoshi’s dedication to advancing coating technologies that meet industry needs.

Career Highlights: Satoshi Takeno has made a name for himself in the coatings industry, particularly through his work at Asahi Kasei Kabushiki Kaisha. His research and development efforts have led to groundbreaking advancements in coating compositions, greatly influencing the market and applications within various industries.

Collaborations: Throughout his career, Satoshi has collaborated with talented individuals such as Masakazu Yamauchi and Takashi Fukuchi. These collaborations have resulted in innovative solutions and have fostered an environment of creativity and technological advancement within his team.

Conclusion: With five patents to his name, Satoshi Takeno represents the spirit of innovation in the field of coating technology. His expertise and contributions not only enhance product performance but also inspire future generations of inventors in research institutions and companies worldwide.

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