Satoshi Kawakami

Title: Satoshi Kawakami: Innovator in Photomask Technology

Introduction

Satoshi Kawakami is a notable inventor based in Gunma-ken, Japan. He has made significant contributions to the field of photomask technology, particularly in the development of dustproof protection solutions for photomasks used in electronic device manufacturing. With a total of 3 patents to his name, Kawakami's work has had a substantial impact on the industry.

Latest Patents

Kawakami's latest patents include innovative designs for frame-supported pellicles that provide dustproof protection for photomasks. One of his patents discloses a frame-supported pellicle that consists of a rigid frame and a transparent plastic film adhesively bonded to one end surface of the frame. This design is specifically aimed at protecting photomasks used in photolithographic patterning for fine electronic devices such as LSIs and liquid crystal display panels. The pellicle is prepared using an adhesive with a glass transition temperature lower than that of the polymeric resin forming the film, ensuring excellent adhesive bonding strength without causing distortion or crease formation.

Another patent proposes an improved frame-supported pellicle that includes a layer of pressure-sensitive adhesive on the other end surface of the frame. This improvement allows for a specific pressure-sensitive adhesive that can be easily demounted from the photomask when heated or irradiated, facilitating the replacement of the pellicle without leaving adhesive fragments on the photomask surface.

Career Highlights

Throughout his career, Satoshi Kawakami has worked with prominent companies in the industry, including Shin-Etsu Chemical Co., Ltd. and Shin-Etsu Polymer Co., Ltd. His experience in these organizations has contributed to his expertise in photomask technology and adhesive bonding processes.

Collaborations

Kawakami has collaborated with notable coworkers such as Yuichi Hamada and Toru Shirasaki. Their combined efforts have further advanced the innovations in photomask protection technologies.

Conclusion

Satoshi Kawakami's contributions to the field of photomask technology through his innovative patents demonstrate his commitment to enhancing the manufacturing processes of electronic devices. His work continues to influence the industry and pave the way for future advancements.